9031.41.00.20—For inspecting photomasks or reticles used in manufacturing semiconductor devices
General
Free
Units
No.
Column 2
50%
Special
9031.41.00.20—For inspecting photomasks or reticles used in manufacturing semiconductor devicesGeneral
Free
Units
No.
Column 2
50%
Special
—
HTS 9031.41.00.20 is the U.S. Harmonized Tariff Schedule classification for For inspecting photomasks or reticles used in manufacturing semiconductor devices. It's a 10-digit statistical line in Chapter 90: Optical, photographic, cinematographic, measuring, checking, precision, medical or surgical instruments and apparatus; parts and accessories thereof, Section XVIII: Optical, Photographic, Cinematographic, Measuring, Checking, Precision, Medical or Surgical Instruments and Apparatus; Clocks and Watches; Musical Instruments; Parts and Accessories Thereof, used by U.S. Customs and Border Protection to determine the duty rate at entry. No Chapter 99 tariff modifications (Section 301, Section 232, IEEPA) or AD/CVD orders currently flag this code in Tandom's catalog.
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HTS 9031.41.00.20 is the U.S. Harmonized Tariff Schedule classification for For inspecting photomasks or reticles used in manufacturing semiconductor devices. It belongs to Chapter 90 of the HTSUS.
The general (Column 1) duty rate for HTS 9031.41.00.20 is Free. This is the most-favored-nation (MFN) rate that applies to imports from World Trade Organization member countries.
The Column 2 rate for HTS 9031.41.00.20 is 50%. This rate applies to imports from countries that do not have normal trade relations with the United States (currently Cuba and North Korea).
No active Chapter 99 tariff overlays (Section 301, Section 232, IEEPA reciprocal, etc.) currently flag HTS 9031.41.00.20 in Tandom's catalog. Use the calculator's date + origin inputs to confirm against any retroactive overlay you may be filing.
No active AD/CVD orders currently flag HTS 9031.41.00.20 in Tandom's catalog. Tandom monitors Federal Register notices daily; a flag will appear here within 24h of any new order's publication.
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